A very compact atomic layer deposition device with a rich process recipe.
Compact tabletop ALD. It can be used for various device development such as surface protection and modification by film formation on semiconductor devices, organic solar cells, nanowires, quantum dots, and more. The process has been developed at a material development base for ALD and CVD. We are continuously increasing the recipes and also accept new process development requests.
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basic information
Installation area: 48x48cm Substrate size: Up to 4 inches Precursor materials: 5 systems Type: Hot wall thermal Chamber temperature: Up to 350℃ Example process recipes: Al2O3, SiO2, TiO2, HfO2, ZrO2, Pt, Ru There is also a customer recipe creation mode With interlock and safety mechanisms
Price range
P7
Delivery Time
※13 weeks
Applications/Examples of results
Semiconductor devices, solar cells (organic, perovskite, nanowire), optical devices, fuel cells, Li-ion batteries, ultra-capacitors, MEMS, quantum dots, surface coatings for nanoparticles, etc.
Company information
A trading company focused on semiconductor manufacturing equipment.
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