Achieving environmentally friendly low emissions and low running costs.
The OEL-Clean series, highly regarded for its cleaning power, allows for the precise control of organic materials deposited on metal masks through its use and the many know-how associated with it, achieving a quality equivalent to that of new masks. It maximizes safety, security, environmental considerations, cleaning precision, cost-effectiveness, and productivity. The use of non-flammable solvent HFE for rinsing and drying ensures safety. The HFE solvent is also rejuvenated into a new liquid through distillation and HC/HFE separation devices, allowing for reuse. 【Features】 ○ Thin film masks are vulnerable to thermal stress, which is mitigated by washing at room temperature to eliminate thermal stress. ○ With the incorporation of a distillation unit, the cleaning solution is rejuvenated into a new liquid, and contaminants are condensed and discharged as a small amount of waste liquid, eliminating the need for traditional complete liquid replacement. ○ A cleaning device for organic EL glass substrates has also been developed. For more details, please contact us or download the catalog.
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basic information
【Features】 ○ The cleaning method is based on a unique "co-solvent method." ○ In the cleaning process, a hydrocarbon-based cleaning solvent (HC) is selected that can completely and quickly dissolve and remove organic materials adhered to the metal mask during the organic EL deposition process. ○ The metal mask after cleaning is rinsed and dried with a non-chlorinated organic solvent (HFE). ○ The hydrocarbon-based cleaning solvent (HC) used in the cleaning process is returned to the cleaning process after distilling and separating the dissolved organic materials using an integrated vacuum distillation unit. ○ The metal mask removed from the cleaning process is sent to the rinsing and drying process. ○ The metal mask that has completed the rinsing process is sent to the vacuum drying process (low vacuum). ○ The entire process is carried out at room temperature, ensuring there is no stress on the metal mask due to temperature. ○ The hydrocarbon-based cleaning solvent (HC) and non-chlorinated organic solvent (HFE) used in this cleaning device are all recycled through distillation and solvent recovery units, significantly reducing running costs. ● For more details, please contact us or download the catalog.
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The three "R" themes that Okawa Kousan Co., Ltd. places great importance on are as follows: ◆ R1 - Recycling (Low Running Costs) We recover all solvents used in the purification process and return them to the cleaning system. ◆ R2 - Repair (Stable Production) We always strive for prompt maintenance and inspections. Regular maintenance is recommended to prevent downtime in the manufacturing process. ◆ R3 - Reduction (Promotion of Eco-friendliness) We reduce the amount of energy and solvent consumption associated with the cleaning equipment.