An environmentally friendly cleaning machine that achieves low emissions and low running costs.
The OEL-Clean series, highly regarded for its cleaning power, allows for the precise control of organic materials deposited on metal masks through its use and the extensive know-how that accompanies it, achieving a quality that is indistinguishable from a new mask. It maximizes safety, security, environmental considerations, cleaning precision, cost-effectiveness, and productivity. The use of non-flammable solvent HFE for rinsing and drying ensures safety. The HFE solvent is also rejuvenated into new liquid through distillation and HC/HFE separation equipment, allowing for reuse. 【Features】 - Thin film masks are sensitive to thermal stress, and this is addressed by washing at room temperature to eliminate thermal stress. - With the incorporation of a distillation unit, the cleaning solution is rejuvenated into new liquid, and contaminants are condensed and discharged as a small amount of waste liquid, eliminating the need for traditional full liquid replacement. - A cleaning machine for organic EL glass substrates has also been developed. For more details, please contact us or download the catalog.
Inquire About This Product
basic information
【Features】 ○ The cleaning method is based on the unique "co-solvent method." ○ In the cleaning process, a hydrocarbon-based cleaning solvent (HC) is selected that can completely and quickly dissolve and remove organic materials adhered to the metal mask during the organic EL deposition process. ○ The metal mask after cleaning is rinsed and dried with a non-chlorinated organic solvent (HFE). ○ The hydrocarbon-based cleaning solvent (HC) used in the cleaning process distills and separates the dissolved organic materials using an integrated vacuum distillation system, and then returns to the cleaning process. ○ The metal masks removed from the cleaning process are sent to the rinsing and drying process. ○ The metal masks that have completed the rinsing process are sent to the vacuum drying process (low vacuum). ○ The entire process is carried out at room temperature, ensuring that there is no stress on the metal masks due to temperature. ○ The hydrocarbon-based cleaning solvent (HC) and non-chlorinated organic solvent (HFE) used in this cleaning device are all recycled through distillation and solvent recovery systems, significantly reducing running costs. ● For more details, please contact us or download the catalog.
Price information
Please contact us.
Delivery Time
※Please contact us.
Applications/Examples of results
For more details, please contact us or download the catalog.
catalog（1）
Download All Catalogs
Company information
The three "R" themes that Okawa Kousan Co., Ltd. places great importance on are as follows: ◆ R1 - Recycling (Low Running Costs) We recover all solvents used in the purification process and return them to the cleaning system. ◆ R2 - Repair (Stable Production) We always strive for prompt maintenance and inspections. Regular maintenance is recommended to prevent downtime in the manufacturing process. ◆ R3 - Reduction (Promotion of Eco-friendliness) We reduce the amount of energy and solvent consumption associated with the cleaning equipment.