Reduction of the number of components in the drive mechanism! High vacuum gate valve developed for semiconductor manufacturing equipment.
We have newly developed a 300mm gate valve for semiconductor manufacturing equipment. By adopting a cam mechanism for the one-action valve, we have achieved compactness, improved maintenance, and reduced costs. With high-speed drive compatibility, it is possible to shorten the takt time. 【Features】 ○ Adoption of a non-sliding mechanism to maintain a clean state within the equipment ○ The valve plate seal section ensures stable sealing performance even under critical applications, preventing metal contact through a unique groove shape ○ A proven cam drive method ensures stable sealing performance ○ Quality and reliability are ensured for long lifespan For more details, please contact us or download the catalog.
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【Specifications】 ○ Operating pressure range: Atmospheric pressure to 1×10^-6 Pa ○ Helium leak rate: Main unit: 1×10^-10 Pa·m3/s or less Valve plate: 1×10^-10 Pa·m3/s or less ○ Compatible differential pressure: Positive pressure, equal pressure, negative pressure ○ Maintenance cycle: 1×10^6 times (excluding valve plate O-ring) ○ Material (valve box, valve plate): SUS or A5052 ● For more details, please contact us or download the catalog.
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Irie Koken of Vacuum Bellows "The master of expansion and contraction at a higher level of airtightness"