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  6. CVD-SiC (Chemical Vapor Deposition) "SiC Products"

CVD-SiC (Chemical Vapor Deposition) "SiC Products"

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last updated:Dec 26, 2017

フェローテックホールディングス
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Opening the future with SiC film technology! SiC products manufactured using a unique chemical vapor deposition method.

The SiC products of Admap, manufactured using our unique CVD - SiC (Chemical Vapor Deposition) method, possess characteristics of ultra-high purity, high corrosion resistance, high oxidation resistance, high heat resistance, and high wear resistance. They have received high acclaim in various fields, including semiconductors, industrial machinery, nuclear power, and aerospace. 【Features】 - Almost no corrosion from acids such as hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, and mixed acid. - High oxidation resistance due to the formation of a silicon dioxide (SiO2) film on the surface. - Stable until sublimation at temperatures exceeding approximately 2000°C, without a melting point or softening point. - A compound that is harder than diamond and boron carbide. - Dense and high purity. For more details, please contact us or download the catalog.

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CVD-SiC (Chemical Vapor Deposition) "SiC Products"

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【Product Introduction】 ○Coating Technology  → Tubes and boats for semiconductor manufacturing equipment, etc. ○Film Single Manufacturing Technology  → Film single boats and SiC dummy wafers / SiC dummy wafers / various film single components, etc. ○Solutions  → Components for ultra-high temperature annealing equipment / hollow and assembled boats / ultra-high purity SiC powder, etc. 【Various Physical Properties of SiC】 [(111) Oriented Materials / Isotropic Materials] ○Density g/cm3: 3.21 / 3.21 ○Bending Strength (Room Temperature) MPa: 382 / 539 ○Tensile Strength (Room Temperature) MPa: 294 / - ○Young's Modulus (Room Temperature) GPa: 478 / 447 ○Hardness: HK:3500 / - ○Coefficient of Thermal Expansion (Room Temperature to 1000℃) 1/K: 4.5×10^-6 / 4.5×10^-6 ○Thermal Conductivity (Thickness Direction) W/m・K: - / 264 ○Thermal Conductivity (In-Plane Direction) W/m・K: 280 / 236 ○Specific Heat J/g・K: 0.65 / 0.67 ○Resistivity Ω・cm: 10^4 ≦ / ≦10^2 ●For more details, please contact us or download the catalog.

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CVD-SiC (Chemical Vapor Deposition) "SiC Products"

CVD-SiC (Chemical Vapor Deposition) "SiC Products"

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Electronic Components and Semiconductors

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FerroTec Holdings Co., Ltd. is actively engaged in three business segments based on product applications and market fields: "Equipment-related business," "Solar cell-related business," and "Electronic device business." In the new energy and electronics industries, we propose high-quality products and services while providing cost-competitive products and services. Additionally, we prioritize activities that consider the global environment as one of our key management issues, progressively adapting to the latest environmental regulatory requirements, developing materials and products that can be utilized in the new energy industry, and contributing to the resolution of global environmental issues. FerroTec Holdings Co., Ltd. aims to contribute to society through manufacturing that leverages core technologies and to remain a company where stakeholders, including customers, shareholders, employees, business partners, and the local community, can enjoy growth.

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