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  3. Scientific and Physics Equipment
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  6. Thin Film Coating Service

Thin Film Coating Service

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last updated:Aug 20, 2016

東邦化研
東邦化研
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New properties for materials! Contract surface treatment processing that meets the needs for forming with various materials.

Toho Kaken Co., Ltd. has been providing contract processing for various surface treatments using ion plating, vacuum deposition, sputtering, and P-CVD for many years. We can accommodate a wide range of projects, from prototype development to medium and small lot production. We respond to the needs for thin film formation using various materials such as single metals, oxides, nitrides, and carbides. 【Service Features】 ■ Support for prototypes and small lots ■ Compatibility with various materials ■ Use of equipment tailored to specifications, materials, and processes ■ Consideration for the environment For more details, please refer to our catalog or feel free to contact us.

    Surface treatment contract service
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Thin Film Coating Service

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  • Related Link - http://www.tohokaken.jp/

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【Service Targets】 [Film Types] ■ Reactive Films: SiO2, Al2O3, TiN, SiC, SiON, etc. ■ Layered Films: Au/Ni/Cr//substrate, Au/Pd/Ti//substrate, SiO2/Al//substrate, etc. ■ Binary Coatings: Au-Sn, Ag-Sn, Ni-Cr, etc. [Substrate Materials] ■ Glass substrates ■ Ceramic-based, Si-Wf ■ Metal substrates: Al, Ti, SUS, etc. ■ Resins: PI, PC, PET, etc. 【Various Equipment】 ■ Vacuum deposition/IP film formation small machine - Film formation area: approximately φ500mm ■ Vacuum deposition/IP film formation medium machine - Film formation area: φ500mm × 2 fixtures ■ Vacuum deposition/IP film formation large machine - Film formation area: approximately □800mm ■ Sputtering equipment - Film formation area: φ300 × ~t50mm ■ P-CVD equipment - Film formation area: φ300 × ~t20mm *For more details, please refer to the catalog or feel free to contact us.

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東邦化研

東邦化研

Electronic Components and Semiconductors

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Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.

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