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  6. Thin Film Contract Processing

Thin Film Contract Processing

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last updated:May 18, 2021

東邦化研
東邦化研
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From prototype development to small-lot production! Surface treatment that transforms parts and materials into multifunctional products.

Toho Kaken Co., Ltd. offers thin film coating services through contract processing, including electron gun vacuum deposition and radio frequency (RF) excited ion plating. In electron gun vacuum deposition, the material to be coated is evaporated using an electron beam gun (EB gun) in a vacuum and then coated onto the target object. Additionally, we also perform RF excited ion plating, which is an advanced version of electron gun vacuum deposition. This method retains the advantages of various evaporation materials while improving adhesion and providing a diversity of conditions. **Features of RF Ion Plating:** - Dense and stable over time - Strong adhesion to substrates - Capable of reactive ion plating - High versatility of coating materials - Diversity of coating conditions For more details, please refer to our catalog or feel free to contact us.

    Surface treatment contract service
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Thin Film Contract Processing

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  • Related Link - http://www.tohokaken.jp/

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【Mechanism of Ion Plating】 - The material to be formed into a film is heated and evaporated using an EB gun (electron gun) in a vacuum. - An RF coil is discharged above the evaporation source, imparting a positive charge to the evaporated particles, thus ionizing them. - The ionized evaporated particles are deposited onto a substrate (product) that has a negative charge, forming a film. 【Film Formation Conditions】 - Thick films are possible. Example: Cu, Al, Sn, SiO, Al2O3 (from a few micrometers to over 10 micrometers depending on the film type). - The quality of the film can be altered. Example: Al film → conductive film, reflective film, corrosion-resistant film, etc. - Low-temperature processing is possible. - Trials on various substrates are possible. Example: Condition: surface-treated, functional substrates, wired substrates. Shape: three-dimensional objects, flat plates, films, etc. Size: can accommodate sizes of φ12 inches and above. *For more details, please refer to the catalog or feel free to contact us.

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Vacuum deposition / Ion plating

Vacuum deposition / Ion plating

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Ion plating method

Ion plating method

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Sputtering method

Sputtering method

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Plasma CVD method

Plasma CVD method

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Company information

東邦化研

東邦化研

Electronic Components and Semiconductors

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Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.

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