High hardness, heat resistance, semiconductor properties, chemical vapor deposition silicon carbide CVD-SiC.
The "CVD-SiC coating" is a thin film with excellent properties of high hardness, heat resistance, and wear resistance, as well as semiconductor characteristics. Using our unique CVD method, we maintain a grade that can be adapted for semiconductor device components, and we deposit high-purity SiC films of over 2mm to create bulk SiC. 【Features】 ■ High hardness ■ Excellent heat resistance ■ Excellent wear resistance ■ Has semiconductor characteristics ■ Can be adapted for semiconductor device components *For more details, please refer to the catalog or feel free to contact us.
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basic information
【Specifications】 ■Color tone: Gray ■Hardness: 2,800 to 3,000 HV ■Film thickness: 500 μm to 5 mm ■Oxidation temperature: 500℃ ■Processing temperature: 1,200 to 1,500℃ ■Crystal orientation: Standard ■Effective diameter ・Small: 200L × 200W × 80T ・Large: φ500L × 600L *For more details, please refer to the catalog or feel free to contact us.
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Applications/Examples of results
【Applications】 ■ Molds for high-temperature glass lenses ■ Semiconductor-related components, etc. *For more details, please refer to the catalog or feel free to contact us.
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Company information
Interface Corporation is a group of experts in PVD and CVD coating. We provide the latest surface treatment technologies and their applications both domestically and internationally. We engage in contract processing for surface treatment of metals and ceramics, as well as the design, manufacturing, and development of CVD and PVD equipment, vacuum equipment design, and gas supply equipment design.