Perfectly eliminates even fine dust! Equipped with a powerful 5700 RPM motor! Dual spin wet mop automatic vacuum cleaner.
2014 CES Innovation Award Winner! (Hosted by the Consumer Technology Association, USA) ◎ Perfectly eliminates harmful fine dust using two rotating mops and an optimal wet mop algorithm. ◎ Maintains moisture in the cleaning mop with an automatic water supply system for continuous use. ◎ Utilizes patented Bunsoom thread + ultra-fine thread, featuring a double fiber structure with strong suction power that effectively absorbs fine dust and liquid contaminants. ◎ Equipped with various cleaning modes: Automatic cleaning, focused cleaning, wall cleaning, manual cleaning, and more. Provides optimized cleaning functions and performance based on the cleaning environment and situation. For more details, please download the catalog or contact us.
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■Product Name Product Name: Rotating Wet Mop Automatic Vacuum Cleaner Model Name: RS500 ■Specifications Size: W368×D201×H141mm Weight: 1.9Kg ■Operating Conditions Power Consumption: 27Wh Noise: 50dB ■Mobility Performance Movement Method: Random Movement Method Obstacle Recognition: Bumper Sensor, 4 Points Fall Prevention: PSD Sensor, 4 Points Movement Speed: 20cm/sec ■Cleaning Performance Cleaning Method: Rotating Wet Mop Exclusive Cleaning Cleaning Modes: Automatic Cleaning, Focused Cleaning, Wall Cleaning, Manual Cleaning, S-Curve Cleaning, Y-Curve Cleaning, Handy Cleaning Water Supply Time: Approximately 20 minutes ■Battery Type: Lithium-ion, 11.1VDC, 2200mA Charging Time: Approximately 150 minutes when fully discharged; 70 minutes in low power mode Usage Time: Wet Mop: Approximately 50 minutes For more details, please download the catalog or contact us.
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Japan Functional Materials will focus on advanced "Group 4" epitaxial growth services as its top priority business. Specifically, this includes epitaxial growth of Si, SiGe, SiGeC, Ge, SOI (Silicon on Insulator), and SOS (Silicon on Sapphire), among others. We will also form multilayer films doped with Group 3/5 elements (such as boron and phosphorus). We accept requests for embedded epitaxial growth into trenches as well. Selective growth will also be conducted. The thickness of each layer is generally on the nanometer order. Production will be carried out by the Lawrence Semiconductor Research Laboratory (LSRL) in the United States. We will receive individual specifications, consolidate them for production, and Japan Functional Materials will serve as an appropriate bridge between customers and manufacturers. Manufacturers capable of accepting orders and producing such epitaxial layers are rare worldwide. Please consult with us first. Upon request, we will visit and provide explanations. We are also involved in various other businesses, so please take a look at our company profile.