By eliminating the liquid medication cleaning process, it is possible to reduce the installation area of the wet bench!
"AURORA" is a low-temperature resist stripping device that can remove resist after ion implantation. By combining plasma treatment and ozone water treatment, it can strip without residue, and it also supports stripping of underlying films (such as Si, SiO2) without film edge issues. Additionally, by eliminating chemical cleaning processes such as sulfuric peroxide and ammonia peroxide, it is possible to reduce running costs and the number of processes. A fast removal rate (2-4μm/min) achieves high throughput. [Features] ■ Stripping performance ■ Cost reduction ■ Reduction of process steps ■ Reduction of installation area *For more details, please feel free to contact us.
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basic information
【Basic Configuration】 ■Transport Robot ■Plasma Treatment Device ■Ozone Water Treatment Device ■High-Concentration Ozone Water Generation Device ■Heating Unit 【Specifications】 ■Number of Chambers: 2 Chambers (1 Plasma Treatment Chamber, 1 Ozone Water Chamber) ■Wafer Diameter: Compatible with 150, 200, 300mm ■Number of Cassettes: 2 Cassettes ■Utilities: DIW, N2, O2, CO2, CDA ■Main Body Dimensions: 1100 (W) × 2050 (D) × 2000 (H) *For more details, please feel free to contact us.
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Applications/Examples of results
【Target Application】 ■Resist stripping after ion implantation *For more details, please feel free to contact us.
Company information
HUG Power Co., Ltd. contributes to the reduction of chemical usage and the lowering of environmental impact through the development, design, and sales of industrial cleaning equipment, centered around cutting-edge cleaning technology cultivated in the semiconductor industry. With the support of many people, we have finally established a path to commercialization since 2009, and shipments to mass production lines have begun. Currently, we are dedicated to fundamentally changing the cleaning processes that use many harmful chemicals, focusing on steam cleaning technology in our daily development efforts.
