This is an introduction to the world's first inline film thickness distribution measurement device that measures interference light using a thin film with an imaging spectrometer.
The imaging spectroscopic camera (hyperspectral camera) spectrally analyzes the reflected light from a linear area and outputs it as a two-dimensional image. By connecting it to a monochrome camera, spectral data from many points can be collected simultaneously.
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■Device Specifications Film Thickness Range: 50nm to 1000nm, 100nm to 5000nm, 1000nm to 100000nm Measurement Size: Field Width: can be set arbitrarily from 50mm to 2000mm Measurement Length: up to 600mm for lab equipment, no restrictions for inline (※) Number of Measurement Points: Width Direction: 1920 points (maximum) × Length Direction: 1920 points (arbitrary) Spatial Resolution: Width Direction: approximately 26μm to approximately 1.04mm Length Direction: depends on measurement conditions Measurement Time: approximately 10000 points/second as standard (Example) approximately 6 minutes for 1920 points × 1920 points Film Thickness Resolution: 1nm Measurement Accuracy: ±1% or ±3nm, whichever is larger Measurement Reproducibility: 0.5% or less Spectral Camera Dimensions: W60xD350xH90mm (excluding cables)
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■Purpose Observation, recording, evaluation, and inspection of the thickness distribution of thin films on target surfaces. ■Examples Coatings on glass and resin surfaces, surface oxide films on silicon wafers and metals, functional films. ■Measurement Examples - Coating layer of monochrome OHP sheets - Coating layer of color OHP sheets - Commercial cooking wrap - Gaps in Newton's rings - Oxide film on silicon wafers - Nitride film on silicon wafers - Polycarbonate on CD surfaces
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