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  6. Comparison of foreign matter removal rates between steam two-fluid cleaning and ultrasonic/high-pressure cleaning is now available.

Comparison of foreign matter removal rates between steam two-fluid cleaning and ultrasonic/high-pressure cleaning is now available.

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last updated:Jul 03, 2024

HUGパワー
HUGパワー
  • Official site

Currently publishing a comparison of removal rates between steam two-fluid cleaning using supersonic jets of steam and liquid, and ultrasonic/high-pressure cleaning (OLED).

The steam two-fluid cleaning unit "SSC series" injects steam and liquid fluids at supersonic speeds from a supersonic injection nozzle, generating micro-cavitation on the surface of the target object for cleaning. By mixing liquid with steam, a two-fluid system is created, significantly enhancing the cleaning power. To suppress metal contamination and the generation of fine foreign substances, a special coating is applied to the surface using specific materials, producing high-purity steam. On this page, we are publishing graph data comparing the foreign substance removal rates of our products with ultrasonic + high-pressure cleaning, specifically targeting organic EL. 【Features】 ■ No consumables like brushes, significantly reducing running costs ■ Only "pure water" is used ■ Significantly reduces the amount of chemical agents used ■ Greatly improves cleaning power ■ Also suitable for semiconductor cleaning *For more details, please request documentation or view the PDF data available for download.

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キャプチャ.JPG

Comparison of foreign matter removal rates between steam two-fluid cleaning and ultrasonic/high-pressure cleaning is now available.

キャプチャ.JPG
キャプチャ.JPG
  • Related Link - https://hugpower.co.jp/

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basic information

【Basic Configuration】 ○ Steam generation device without metal contamination ○ Supersonic steam injection nozzle ○ Communication with the cleaning machine body 【Steam Generation Device】 ○ Steam generation capacity: 2–100 kg/h * Sizes available to match the required steam volume ○ Utilities: DIW, N2, CDA, 200VAC or 100VAC ○ Steam pressure control range: 0.05-0.3 MPa ● For more details, please contact us or download the catalog.

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Applications/Examples of results

【Applications】 ○ Cleaning of solar cell substrates ○ Gold film removal in LED manufacturing ○ Semiconductor manufacturing processes ○ Cleaning of glass substrates, etc. ○ Removal of foreign substances and polymers ○ Removal of oils, fingerprints, etc. ○ Applications in medicine ○ Applications in beauty ● For more details, please contact us or download the catalog.

Detailed information

  • キャプチャ.JPG

    Above two fluid cleaning examples Cleaning examples

  • コア技術.jpg

    Core technology

catalog(8)

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Steam Two-Fluid Cleaning Unit "SSC Series"

Steam Two-Fluid Cleaning Unit "SSC Series"

PRODUCT
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Case Study (Platinum Residue Cleaning) Steam Two-Fluid Cleaning Unit "SSC Series"

Case Study (Platinum Residue Cleaning) Steam Two-Fluid Cleaning Unit "SSC Series"

TECHNICAL
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Case Study (Regist Membrane Permeation) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Regist Membrane Permeation) Steam Two-Fluid Cleaning Unit SSC Series

TECHNICAL
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Case Study (Beer Hall Cleaning) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Beer Hall Cleaning) Steam Two-Fluid Cleaning Unit SSC Series

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Case Study (Contact Angle Measurement) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Contact Angle Measurement) Steam Two-Fluid Cleaning Unit SSC Series

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Case Study (Cutting Powder Removal) Steam Two-Fluid Cleaning Unit SSC Series

Case Study (Cutting Powder Removal) Steam Two-Fluid Cleaning Unit SSC Series

TECHNICAL
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Comparison of foreign matter removal rates between steam two-fluid cleaning and ultrasonic/high-pressure cleaning is now available.

Comparison of foreign matter removal rates between steam two-fluid cleaning and ultrasonic/high-pressure cleaning is now available.

TECHNICAL
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  • Catalog download

Contact this catalog

Steam two-fluid cleaning device

Steam two-fluid cleaning device

CATALOG
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Company information

HUGパワー

HUGパワー

Electronic Components and Semiconductors

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HUG Power Co., Ltd. contributes to the reduction of chemical usage and the lowering of environmental impact through the development, design, and sales of industrial cleaning equipment, centered around cutting-edge cleaning technology cultivated in the semiconductor industry. With the support of many people, we have finally established a path to commercialization since 2009, and shipments to mass production lines have begun. Currently, we are dedicated to fundamentally changing the cleaning processes that use many harmful chemicals, focusing on steam cleaning technology in our daily development efforts.

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