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  3. Measurement and Analysis
  4. Analytical Instruments
  5. Spectroscopic Analysis Equipment
  6. Dual X-ray Photoelectron Spectroscopy System 'PHI Quantes'

Dual X-ray Photoelectron Spectroscopy System 'PHI Quantes'

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last updated:Apr 18, 2018

アルバック・ファイ 営業部 (国内・海外)
アルバック・ファイ 営業部 (国内・海外)
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XPS opens up new application areas that go beyond conventional wisdom!

The "PHI Quantes" is a scanning dual X-ray photoelectron spectroscopy (XPS) device equipped with two X-ray sources: hard X-rays (Cr Kα line) with different energy levels and conventional soft X-rays (Al Kα line), enabling high-sensitivity analysis from micro-regions to large areas. The two types of X-ray sources can be switched automatically in a short time, allowing analysis of the same location on the sample. 【Features】 ■ Scanning dual monochromator X-ray source ■ Easy measurement of the same area with two sources ■ Turnkey charge neutralization ■ Automatic analysis ■ High-voltage resistant analyzer *For more details, please download the PDF or feel free to contact us.

    Spectroscopic Analysis Equipment
デュアルX線光電子分光分析装置『PHI

Dual X-ray Photoelectron Spectroscopy System 'PHI Quantes'

デュアルX線光電子分光分析装置『PHI Quantes』.PNG
デュアルX線光電子分光分析装置『PHI Quantes』.PNG
  • Related Link - https://www.ulvac-phi.com/ja/products/xps/quantes/

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Dual X-ray Photoelectron Spectroscopy Analyzer 'PHI Quantes'

Dual X-ray Photoelectron Spectroscopy Analyzer 'PHI Quantes'

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アルバック・ファイ

アルバック・ファイ 営業部 (国内・海外)

Testing, Analysis and Measurement

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ULVAC-PHI, Inc. provides advanced surface analysis instruments, including X-ray Photoelectron Spectroscopy (XPS), Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS, D-SIMS), and Scanning Auger Electron Spectroscopy (AES) as a manufacturer of these devices. We take our customers' feedback seriously in all areas, from quality control to research and development, and we respond to various requests with our outstanding surface analysis technology and comprehensive after-sales service system. Additionally, by promoting innovative product development and cutting-edge surface analysis technology, we contribute to the development of next-generation technologies.

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