Explaining the details and specific applications of the ALD method (Atomic Layer Deposition), which has shown remarkable development in recent years!
A valuable book summarizing what can be achieved through the ALD method for researchers and engineers involved in the mutual conversion of energy such as solar, electricity, and heat!
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■Format: B5 size, 328 pages ■Price: 32,000 yen + tax ■Original book: "Atomic Layer Deposition in Energy Conversion Applications" Wiley (2017) ■Supervised by: Yuji Suzuki, Translated by: Chiaki Hirose ■Published by: NTS ■Table of Contents Chapter 1: Fundamentals of Atomic Layer Deposition: Characteristics and Similarities of Film Growth Chapter 2: Atomic Layer Deposition for Passivation in Si Solar Cells Chapter 3: ALD for Light Absorption Chapter 4: Atomic Layer Deposition (ALD) for Surface and Interface Engineering in Nanostructured Solar Cells Chapter 5: Atomic Layer Deposition of Electrocatalysts for Fuel Cells and Electrolyzers Chapter 6: Atomic Layer Deposition for Thin-Film Lithium-Ion Batteries Chapter 7: ALD Processed Oxides for High-Temperature Fuel Cells Chapter 8: ALD for Photoelectrochemical Water Splitting Chapter 9: Atomic Layer Deposition for Thermoelectric Materials
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32,000 yen plus tax
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P2
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P2
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Technical book
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NTS selects reliable information from the overwhelming amount of information through seminars, publications, and literature information activities, and passes it on to the next generation. From abundance to certainty—that is the philosophy of NTS's activities.