A lineup of equipment suitable for various film deposition, oxide film formation, and annealing processes suitable for semiconductor processing!
We can perform optimal carbon film deposition for SiC as a pre-treatment using PBII, annealing treatment using RTA, and pre- and post-annealing treatments in our company.
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basic information
Film Formation - PBII (Plasma Based Ion Implantation) Capable of carbon film formation - Sputtering Capable of electrode film formation Heat Treatment - RTA (Rapid Thermal Annealing) Capable of heat treatment up to ~1800 degrees using a vertical high-frequency induction heating method - Oxidation Furnace Oxidation and heat treatment
Price information
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Delivery Time
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Applications/Examples of results
In semiconductor film deposition and heat treatment, we are widely utilized by domestic companies and universities.
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Company information
The Ion Tech Center is a professional group that provides consulting and technical development support in "ion implantation," "physical analysis," and research and development. We aim to be a good partner for companies and university researchers as a creative laboratory equipped with cutting-edge technology and facilities that meet the demands of the times.