Applicable to microfabrication equipment! Introducing a high-output plasma source with ECR discharge type.
The "EPS-120" is a high-output plasma source of the ECR (Electron Cyclotron Resonance) discharge type that can be applied to microfabrication equipment. It features a modular concept that achieves large-area plasma through multiple arrangements. It can be applied to source power for dry etching equipment and ashing equipment, as well as to ion sources for reactive ion beam etching (RIBE) equipment. 【Features】 ■ Large-volume ECR magnetic field due to an innovative magnet configuration ■ kW-level high power operation enabled by a powerful cooling system ■ Dielectric lining that is free from metal contamination ■ Modular concept that achieves large-area plasma through multiple arrangements *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Device Specifications】 ■ Connection vacuum port diameter: φ120mm ■ Connection waveguide standard: WR340 ■ Compatible microwave frequency: 2.45GHz ■ Maximum allowable microwave power: 2,000W ■ Cooling method: Water cooling *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Application Examples】 ■ Source power for dry etching equipment and ashing equipment ■ Ion source for reactive ion beam etching equipment (RIBE) ■ Plasma source for ion nitriding/oxidation equipment and DLC film deposition equipment *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Noberion Systems Co., Ltd. is a company that develops and manufactures plasma application devices and offers contract processing for special film deposition processes. As a technology development-oriented venture company, it is advancing the development of ECR (Electron Cyclotron Resonance) high-density plasma sources and ECR high-current ion beam sources to meet new technological needs using oxygen and various active gases.