ノベリオンシステムズ Product Lineup

The "LBS-120HC" is a high-current DC discharge line beam ion source that can be applied to high-speed ion beam milling equipment. It features a high-current density ion beam using a thermionic cathode, with excellent beam distribution uniformity achieved through optimized magnetic field design. Additionally, we offer a dedicated power supply "SPS-HC2" designed for fully automated high-speed beam adjustment. 【LBS-120HC Features】 ■ High-current density ion beam using a thermionic cathode ■ Excellent beam distribution uniformity due to optimized magnetic field design ■ High-speed beam adjustment through a fully automated power control system ■ Equipped with a neutralizer *For more details, please refer to the PDF document or feel free to contact us.

• Ion implantation equipment
• DC Motor

Our company is engaged in the development of new technologies related to plasma and ion beam. After receiving your inquiry, we will conduct detailed discussions and provide a proposal and estimate. Once a contract is signed, we will begin the design of the development equipment. Upon your approval of the design, we will proceed with manufacturing and testing, and submit the results report and equipment drawings. If you are facing difficulties, such as having a research and development theme but lacking personnel for design, please feel free to consult with us. [Development Examples] ■ ECR line beam ion source ■ Sputtering deposition equipment for compound thin films ■ High-power ECR plasma source ■ Charged particle energy analyzer ■ Matching elements *For more details, please refer to the PDF materials or feel free to contact us.

• Mechanical Design
• Plasma Generator
• Plasma surface treatment equipment

The "ELBS-150" is a line beam ion source of the ECR (Electron Cyclotron Resonance) discharge type that can be applied to reactive ion beam milling equipment. It features high-power microwave drive with a newly developed large coaxial input terminal (7/16 type). It can be applied to milling of magnetic heads and trimming adjustments of high-frequency circuits. 【Features】 - Uniform long ion beam due to innovative magnetic circuit design - High-power microwave drive with newly developed large coaxial input terminal (7/16 type) - Dielectric lining that is metal contamination-free - Newly developed long-life beam electrode *For more details, please refer to the PDF document or feel free to contact us.

• Electron beam lithography equipment
• Other machine elements

This product is a large ion source suitable for high-speed milling processing using a large-area ion beam. By adopting heat-resistant/low-sputter-rate electrode materials, it generates low-energy ampere-class ion beams. We offer custom-made solutions to meet your requirements. 【Features】 ■ Optimization of beam uniformity through charged particle trajectory simulation ■ Adoption of heat-resistant/low-sputter-rate electrode materials ■ Generation of low-energy ampere-class ion beams *For more details, please refer to the PDF document or feel free to contact us.

• Electron beam lithography equipment
• Other machine elements

The "ERS-35" is a compact atomic beam source (radical source) of the ECR discharge type that can be adapted to ultra-high vacuum devices such as MBE. It is compatible with ultra-high vacuum devices due to its complete metal seal. It features easy handling with coaxial cable power supply. It can be applied as a nitrogen/oxygen radical source for MBE devices or as an atomic hydrogen source for surface cleaning. 【Features】 ■ Compatible with ultra-high vacuum devices due to complete metal seal ■ Easy handling with coaxial cable power supply ■ Dielectric lining that is metal contaminant-free ■ Dielectric extraction grid with bias electrode, excellent for generating radical beams *For more details, please refer to the PDF document or feel free to contact us.

• Electron beam lithography equipment

The "EPS-120" is a high-output plasma source of the ECR (Electron Cyclotron Resonance) discharge type that can be applied to microfabrication equipment. It features a modular concept that achieves large-area plasma through multiple arrangements. It can be applied to source power for dry etching equipment and ashing equipment, as well as to ion sources for reactive ion beam etching (RIBE) equipment. 【Features】 ■ Large-volume ECR magnetic field due to an innovative magnet configuration ■ kW-level high power operation enabled by a powerful cooling system ■ Dielectric lining that is free from metal contamination ■ Modular concept that achieves large-area plasma through multiple arrangements *For more details, please refer to the PDF document or feel free to contact us.

• Plasma Generator
• Plasma surface treatment equipment

Noberion Systems Co., Ltd. is a technology development venture company originating from the large current negative ion source technology for nuclear fusion plasma heating devices. In response to new technological needs, we are developing an ECR (Electron Cyclotron Resonance) high-density plasma source and an ECR large current ion beam source that can use oxygen and various active gases. Customers considering various plasma application devices are encouraged to contact us. 【Business Description】 ■ Development and manufacturing sales of plasma application devices ■ Contract processing of special film deposition processes *For more details, please refer to our catalog or feel free to contact us.

• Processing Contract
• Other contract services
• Other electronic parts