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  4. Semiconductor Manufacturing Equipment
  5. Electron beam lithography equipment
  6. Small ECR Atomic Beam Source 'ERS-35'

Small ECR Atomic Beam Source 'ERS-35'

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last updated:Dec 19, 2023

ノベリオンシステムズ
ノベリオンシステムズ
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Metal contaminant-free dielectric lining! A compact ECR atomic beam source compatible with ultra-high vacuum equipment.

The "ERS-35" is a compact atomic beam source (radical source) of the ECR discharge type that can be adapted to ultra-high vacuum devices such as MBE. It is compatible with ultra-high vacuum devices due to its complete metal seal. It features easy handling with coaxial cable power supply. It can be applied as a nitrogen/oxygen radical source for MBE devices or as an atomic hydrogen source for surface cleaning. 【Features】 ■ Compatible with ultra-high vacuum devices due to complete metal seal ■ Easy handling with coaxial cable power supply ■ Dielectric lining that is metal contaminant-free ■ Dielectric extraction grid with bias electrode, excellent for generating radical beams *For more details, please refer to the PDF document or feel free to contact us.

    Electron beam lithography equipment
2020-03-25_15h35_02.png

Small ECR Atomic Beam Source 'ERS-35'

2020-03-25_15h35_02.png
2020-03-25_15h35_02.png
  • Related Link - https://www.novelion-sys.com/2016/11/11/ers_35/

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basic information

【Device Specifications】 ■ Connection Vacuum Port Standard: ICF70 ■ Coaxial Connector Standard: N-type ■ Compatible Microwave Frequency: 2.45GHz ■ Maximum Microwave Power: 100W ■ Cooling Method: Water Cooling *For more details, please refer to the PDF document or feel free to contact us.

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【Application Examples】 ■ Nitrogen/Oxygen Radical Source for MBE Equipment ■ Atomic Hydrogen Source for Surface Cleaning *For more details, please refer to the PDF document or feel free to contact us.

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ノベリオンシステムズ

ノベリオンシステムズ

Manufacturing and processing contract

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Noberion Systems Co., Ltd. is a company that develops and manufactures plasma application devices and offers contract processing for special film deposition processes. As a technology development-oriented venture company, it is advancing the development of ECR (Electron Cyclotron Resonance) high-density plasma sources and ECR high-current ion beam sources to meet new technological needs using oxygen and various active gases.

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