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  1. Home
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  3. Manufacturing and processing machinery
  4. Semiconductor Manufacturing Equipment
  5. Ion implantation equipment
  6. High Current DC Discharge Type Line Beam Ion Source 'LBS-120HC'

High Current DC Discharge Type Line Beam Ion Source 'LBS-120HC'

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last updated:Dec 25, 2023

ノベリオンシステムズ
ノベリオンシステムズ
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Compatible with large substrates! High-speed beam adjustment using a fully automated power control system.

The "LBS-120HC" is a high-current DC discharge line beam ion source that can be applied to high-speed ion beam milling equipment. It features a high-current density ion beam using a thermionic cathode, with excellent beam distribution uniformity achieved through optimized magnetic field design. Additionally, we offer a dedicated power supply "SPS-HC2" designed for fully automated high-speed beam adjustment. 【LBS-120HC Features】 ■ High-current density ion beam using a thermionic cathode ■ Excellent beam distribution uniformity due to optimized magnetic field design ■ High-speed beam adjustment through a fully automated power control system ■ Equipped with a neutralizer *For more details, please refer to the PDF document or feel free to contact us.

    DC MotorIon implantation equipment
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High Current DC Discharge Type Line Beam Ion Source 'LBS-120HC'

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  • Related Link - https://www.novelion-sys.com/2023/11/29/%e5%a4%a7%…

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basic information

【Lineup】 ■LBS-120HC ■SPS-HC2 *For more details, please refer to the PDF document or feel free to contact us.

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Applications/Examples of results

【Application Examples】 ■High-speed milling of MEMS structures ■Precision milling of magnetic memory ■Resonant frequency adjustment of high-frequency devices *For more details, please refer to the PDF document or feel free to contact us.

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High Current DC Discharge Type Line Beam Ion Source "LBS-120HC"

High Current DC Discharge Type Line Beam Ion Source "LBS-120HC"

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ノベリオンシステムズ

ノベリオンシステムズ

Manufacturing and processing contract

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Noberion Systems Co., Ltd. is a company that develops and manufactures plasma application devices and offers contract processing for special film deposition processes. As a technology development-oriented venture company, it is advancing the development of ECR (Electron Cyclotron Resonance) high-density plasma sources and ECR high-current ion beam sources to meet new technological needs using oxygen and various active gases.

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