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  6. Plasma-related products RF radical beam source IRFS-504

Plasma-related products RF radical beam source IRFS-504

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IRFS-504

last updated:Jun 10, 2011

アリオス
アリオス
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Chemically active radicals are formed by ICP-type RF discharge, and the flux is drawn out by differential pressure.

The discharge section and the extraction section are made of high-purity PBN, allowing for long-term stable operation even during the introduction of reactive gases, and enabling the generation of a clean atomic and radical beam. It has particularly proven effective as a nitrogen radical source, with a wealth of experience.

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Plasma-related products RF radical beam source IRFS-504

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  • Related Link - http://www.arios.co.jp/products/irfs.html

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【Features】 ○ A viewport that allows visual confirmation of discharge is standard equipment. You can check the discharge state and excitation state using a light monitor and spectrometer. ○ With a complete metal seal and 200℃ bakeable compatibility, it can be used in various ultra-high vacuum devices such as MBE systems. ○ Designed with the installation of a molecular beam cell port in mind, it can be added to conventional MBE systems. ○ The automatic matching mechanism makes operation simple and allows for stable long-term operation. ● For more details, please contact us or refer to the catalog.

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Plasma-related products RF radical beam source IRFS-504

Plasma-related products RF radical beam source IRFS-504

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アリオス

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Industrial Machinery

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In 1972, the first president, Horita, established Taisei Sangyo Co., Ltd. using the entrance of his home as a workplace, and since then, we have been dedicated to technology development and research. Initially, we were involved in the development of devices such as the Polack counter for the Meteorological Research Institute, starting our work in the field of atmospheric science. Subsequently, we expanded our work into the vacuum world by starting maintenance services for leak detectors. Around the 10th anniversary of our founding, work in ultra-high vacuum began to increase, and by the 15th anniversary, we were able to manufacture small devices. Currently, our scope of work has significantly expanded, not only covering ultra-high vacuum, MBE, CVD, ECR, and RF radical sources, but also advancing the development of functional components utilizing various plasmas, ions, or electrons. In the future, we aim to become a small enterprise that can truly compete in the world of cutting-edge technology.

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