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  6. Photoresist stripping solution "Unrust M601"

Photoresist stripping solution "Unrust M601"

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last updated:Mar 31, 2020

三若純薬研究所
三若純薬研究所
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Compatible with immersion and spray methods! High permeability allows for detachment down to the details!

"Unrust M601" is a photoresist stripping solution of the organic alkaline type that can also be used on aluminum substrates. It is available in 20kg cans/drums. Due to its high permeability, it can strip down to fine details. It is compatible with both immersion and spray methods. 【Processing Conditions】 ■ Concentration: Undiluted ■ Temperature: Room temperature to 70℃ ■ Time: 20 to 90 seconds *For more details, please refer to the PDF document or feel free to contact us.

    Chemicals
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Photoresist stripping solution "Unrust M601"

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image_07.png
  • Related Link - https://www.mitsuwaka.co.jp/product/photoresist/m6…

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【Other Features】 ■Target materials: Aluminum, dry film, positive resist ■Industries using it: Electronics industry *For more details, please refer to the PDF document or feel free to contact us.

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Applications/Examples of results

【Usage】 ■Peeling of the resist *For more details, please refer to the PDF document or feel free to contact us.

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Sanraku Pure Drug Research Institute Company Profile

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三若純薬研究所

三若純薬研究所

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Sanraku Pure Chemical Research Institute started with the repackaging and blending of inorganic chemicals, and now we are engaged in contract manufacturing and sales of precision chemical products, as well as the development and production of our original resist stripping agents and metal surface treatment chemicals. We have always prioritized safety, stable high quality, reasonable pricing, and speedy responses, and we will continue to enhance the "power of manufacturing."

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