Cleaning agent for photoresist development equipment! It can also be used on soft rubber such as NBR.
"Unrust RMR-2" is an alkaline-type water-soluble cleaning agent. It has low foaming properties and can be used on soft rubber materials such as NBR. By applying it to equipment where dry film resist and other substances have adhered, and wiping it off with a cloth, you can easily clean the equipment. 【Features】 - Easily cleans equipment by applying it to areas where dry film resist and other substances have adhered and wiping it off with a cloth. - Low foaming properties. - Usable on soft rubber materials such as NBR. - Alkaline-type water-soluble cleaning agent. *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Other Features】 ■Processing Conditions ・Concentration: Undiluted or diluted with water ・Temperature: Room temperature ■Target Materials ・Dry film ・Positive resist ■Industries Using This Product ・Electronics industry ■Capacity and Packaging ・From 10kg cans to tank trucks *For more details, please refer to the PDF document or feel free to contact us.
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【Purpose】 ■Cleaning agent for cleaning photoresist development equipment *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Sanraku Pure Chemical Research Institute started with the repackaging and blending of inorganic chemicals, and now we are engaged in contract manufacturing and sales of precision chemical products, as well as the development and production of our original resist stripping agents and metal surface treatment chemicals. We have always prioritized safety, stable high quality, reasonable pricing, and speedy responses, and we will continue to enhance the "power of manufacturing."