Introducing a photo mask cleaning agent that does not require cleaning after wiping due to its high volatility!
"Unrust RC-2" is an industrial cleaning agent that can be applied to objects such as glass and dry film. Due to its high volatility, no cleaning is required after wiping. It allows for the removal of dirt without damaging the photomask. 【Features】 ■ Allows for the removal of dirt without damaging the photomask ■ No cleaning required after wiping due to high volatility ■ Applicable regulations: Fire Service Act, Hazardous Materials Class 4, Type 1 Petroleum *For more details, please refer to the PDF materials or feel free to contact us.
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basic information
【Other Features】 ■Processing Conditions ・Concentration: Undiluted ・Temperature: Room temperature ■Target Materials ・Glass ・Dry film ・Others ■Industries in Use ・Electronics Industry ■Capacity and Packaging ・14kg can *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Usage】 ■ Photo mask cleaning agent *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Sanraku Pure Chemical Research Institute started with the repackaging and blending of inorganic chemicals, and now we are engaged in contract manufacturing and sales of precision chemical products, as well as the development and production of our original resist stripping agents and metal surface treatment chemicals. We have always prioritized safety, stable high quality, reasonable pricing, and speedy responses, and we will continue to enhance the "power of manufacturing."
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