It supports patterning of chrome films, thin glass metal films, SiO2 films, and more!
We offer "metal film patterning processing services using wet etching." We accommodate patterning for metal film multilayer wiring, including chrome films, thin glass metal films, and SiO2 films. Please contact us when you need our services. 【Features】 ■ Patterning of metal film multilayer wiring - Transparent metal film: ITO film - White metal film: AL alloy film (W/10μm) *For more details, please refer to the PDF document or feel free to contact us.
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【Other Features】 ■ Patterning of Chrome Film - Two-layer film of Cr/CrO - Film thickness: 1500Å ■ Patterning of Metal Film on Thin Glass - Glass plate thickness: 100μm - Metal film thickness: 2000Å *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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In 1983, we were established as a thin film metal patterning factory of Micron Technology Research Institute, focusing on LCD substrates and PDP substrates, and have been producing cutting-edge products using photolithography and etching technologies. In 2007, we became a separate company as Kiso Micro Co., Ltd., enhancing our commitment to challenge ourselves with more creative products and aiming to be a trusted company by our customers as a company that can create for the future. Please utilize our services from development to mass production.