KISO WAVE
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KISO WAVE Company Overview
We will build a world of electronics and optics based on our unique manufacturing technology and outstanding engineering spirit, contributing to the future of information communication.
In 1983, we were established as a thin film metal patterning factory of Micron Technology Research Institute, focusing on LCD substrates and PDP substrates, and have been producing cutting-edge products using photolithography and etching technologies. In 2007, we became a separate company as Kiso Micro Co., Ltd., enhancing our commitment to challenge ourselves with more creative products and aiming to be a trusted company by our customers as a company that can create for the future. Please utilize our services from development to mass production.
Business Activities
◇ Fine pattern processing of various metal films ◇ Chemical polishing (glass etching) of various glasses ◇ Fine pattern processing of SiO2 films We handle the above processing widely from development to mass production. 【Examples of Use】 1. Touch panels: Resistive film type / Capacitive type 2. Display screens: LCD / PDP / Organic EL / Electronic paper 3. Lighting and energy: LED / Organic solar cells 4. Bio, optical, MEMS: Microchips / Diffraction gratings / Sensors 5. Mobile decoration: Decoration (glass, film, plastic) We can accommodate substrate materials such as glass, film, and plastic. Please also consult us regarding the combination of plating technology and printing technology.
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Detailed information
| Company name | KISO WAVE |
|---|---|
| Contact address | postalcode 397-0001 Nagano/ Kiso-cho, Kiso-gun/ Fukushima 1652View on map TEL：0264-24-0037 FAX：0264-24-0038 |
| Industry | Electronic Components and Semiconductors |
KISO WAVE Building Image 
