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  6. Dry Pump A Series

Dry Pump A Series

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A Series by Fifer Vacuum Company

last updated:Apr 18, 2022

伯東 本社
伯東 本社
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Industry-leading basic performance

A100L / A200L • Ideal dry pump for use in transfer chambers for load locks and clean processes • Low vibration, high throughput: capable of 300 cycles per hour in a 20L L/L chamber • Achieves low power consumption through the use of a high-efficiency motor • Compact design with a footprint of 0.17m²; can be positioned vertically or horizontally • Can be stacked in two layers (horizontal only with the intake facing) A103P • For medium processes (etchers, ion implantation, PVD, etc.) • Energy-saving and space-saving A4 Series • Achieves low power consumption through a multi-root structure and high-efficiency motor • Suppresses the accumulation of by-products through heater temperature control • Long pump life due to corrosion-resistant nickel coating (XN model) • Extends the operating time of process equipment with excellent particle exhaust capability • Enhanced monitoring features for better control of pump status (cooling water sensor, vibration box, etc.) • Prevents clogging in the pump and exhaust piping with hot N2 • Complies with IP33, SEMI S2, and UL standards

    Vacuum pump
A-100-L-ES.jpg

Dry Pump A Series

A-100-L-ES.jpg
A-100-L-ES.jpg A4-Serie.jpg
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basic information

FaiFaa Vacuum Company is headquartered in Aslar, Germany, and has been developing and manufacturing cutting-edge vacuum equipment, vacuum measurement instruments, and vacuum analysis instruments since 1890. The company developed the world's first turbo pump over 50 years ago. Since then, it has continued to innovate and has established itself as a leading company in this field, providing optimal vacuum environments to customers across various sectors, including semiconductors, analysis, coating, industry, and R&D in countries around the world.

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Applications/Examples of results

【Application】 A100L / A200L • Ideal dry pumps for use in transfer chambers for load locks and clean processes. A103P • Suitable for medium processes (etchers, ion implantation, PVD, etc.). ADH Series • Best suited for ALD, epitaxial growth, and EUV processes (can be used with hydrogen and silane-based gases).

Detailed information

  • A-100-L-ES.jpg

    The vacuum section of the pump does not use lubricating oil, allowing for an oil-free and clean vacuum. Dry pumps are gas transfer type vacuum pumps, with structural differences such as diaphragm, screw, scroll, and Roots types, and we provide the optimal pump suited to your applications. A100L / A200L • Ideal dry pump for use in transfer chambers for load locks and clean processes • Low vibration, high throughput: capable of 300 cycles per hour in a 20L L/L chamber • Achieves low power consumption through the use of a high-efficiency motor • Compact design with a footprint of 0.17m²; can be positioned vertically or horizontally • Can be stacked in two layers (only horizontal with the intake facing) A103P • For medium processes (etching, ion implantation, PVD, etc.) • Energy-saving and space-saving

  • A4-Serie.jpg

    The vacuum section of the pump does not use lubricating oil, allowing for an oil-free and clean vacuum. Dry pumps are gas transfer vacuum pumps with structural differences such as diaphragm, screw, scroll, and Roots types, and we provide the optimal pump suited to your applications. A4 Series • Achieves low power consumption with a multi-Roots structure and high-efficiency motor • Suppresses the accumulation of by-products through heater temperature control • Long pump lifespan due to corrosion-resistant nickel coating (XN model) • Extends the operating time of process equipment with excellent particle exhaust capability • Enhanced monitoring functions allow for better control of pump conditions (cooling water sensors, vibration boxes, etc.) • Prevents clogging in the pump and exhaust piping with hot N2 • Complies with IP33, SEMI S2, and UL standards

  • ADH.jpg

    The vacuum section of the pump does not use lubricating oil, allowing for an oil-free and clean vacuum. Dry pumps are gas transfer type vacuum pumps, with structural differences such as diaphragm, screw, scroll, and Roots types, and we provide the optimal pump suited to your application. ADH Series • High-performance dry pumps for high-end processes • Exhaust performance of H2 gas equivalent to that of N2 gas • Ideal for ALD, epitaxial growth, and EUV processes (can be used with hydrogen and silane-based gases) • Achieves low power consumption through multi-Roots structure, high-efficiency motor, and idling mode • High-power motor reduces large particle discharge and failures during pump restart

Line up(18)

Model number overview
A100L • Exhaust speed: 1,667 l/min • Achieved vacuum level: 0.66 Pa • Inlet diameter: 50ISO-KF • Exhaust diameter: 25ISO-KF
A200L • Exhaust speed: 3,340 l/min • Achieved vacuum level: 1.3 Pa • Inlet diameter: 50ISO-KF • Exhaust diameter: 25ISO-KF
A103P • Model for corrosive gas exhaust • Exhaust speed: 2,000 l/min • Achieved vacuum level: 0.65 Pa • Inlet diameter: 50ISO-KF • Exhaust diameter: 25ISO-KF
A124H/X • Model for corrosive gas exhaust • Exhaust speed: 1,587 l/min (50Hz), 1,837 l/min (60Hz) • Achieved vacuum level: 5 / 2 Pa (50Hz/60Hz, without purge), 30 / 10 Pa (50Hz/60Hz, with purge) • Inlet diameter: 50ISO-K • Exhaust diameter: 40ISO-KF
A204H/X • Model for corrosive gas exhaust • Exhaust speed: 2,158 l/min (50Hz), 2,656 l/min (60Hz) • Achieved vacuum level: 20 / 5 Pa (50Hz/60Hz, without purge), 70 / 20 Pa (50Hz/60Hz, with purge) • Inlet diameter: 50ISO-K • Exhaust diameter: 40ISO-KF
A604H • Exhaust speed: 7,968 l/min (50Hz), 9,296 l/min (60Hz) • Achieved vacuum level: 0.3 / 0.2 Pa (50Hz/60Hz, without purge), 1 / 0.6 Pa (50Hz/60Hz, with purge) • Inlet diameter: 100ISO-K • Exhaust diameter: 40ISO-KF
A804H/X • Model for corrosive gas exhaust • Exhaust speed: 9,960 l/min (50Hz), 11,620 l/min (60Hz) • Achieved vacuum level: 0.8 / 0.4 Pa (50Hz/60Hz, without purge), 2 / 0.9 Pa (50Hz/60Hz, with purge) • Inlet diameter: 100ISO-K • Exhaust diameter: 40ISO-KF
A1204H • Exhaust speed: 17,535 l/min (50Hz), 19,200 l/min (60Hz) • Achieved vacuum level: 0.3 / 0.2 Pa (50Hz/60Hz, without purge), 1 / 0.6 Pa (50Hz/60Hz, with purge) • Inlet diameter: 160ISO-K • Exhaust diameter: 40ISO-KF
A1504H/X • Model for corrosive gas exhaust • Exhaust speed: 18,260 l/min (50Hz), 19,920 l/min (60Hz) • Achieved vacuum level: 0.8 / 0.4 Pa (50Hz/60Hz, without purge), 2 / 0.9 Pa (50Hz/60Hz, with purge) • Inlet diameter: 160ISO-K • Exhaust diameter: 40ISO-KF
A1804H/X • Model for corrosive gas exhaust • Exhaust speed: 27,555 l/min (50Hz), 28,390 l/min (60Hz) • Achieved vacuum level: 0.8 / 0.4 Pa (50Hz/60Hz, without purge), 2 / 0.9 Pa (50Hz/60Hz, with purge) • Inlet diameter: 160ISO-K • Exhaust diameter: 40ISO-KF
A3004H/X • Model for corrosive gas exhaust • Exhaust speed: 49,800 l/min (60Hz) • Achieved vacuum level: 0.4 Pa (60Hz, without purge), 0.9 Pa (60Hz, with purge) • Inlet diameter: 160ISO-K • Exhaust diameter: 40ISO-KF
A804XN • Model for corrosive gas exhaust (Ni coating) • Exhaust speed: 9,960 l/min (60Hz) • Achieved vacuum level: 1.45 Pa (60Hz, without purge), 2.4 Pa (60Hz, with purge) • Inlet diameter: 100ISO-K • Exhaust diameter: 40ISO-KF
A1504XN • Model for corrosive gas exhaust (Ni coating) • Exhaust speed: 18,260 l/min (60Hz) • Achieved vacuum level: 1.45 Pa (60Hz, without purge), 2.4 Pa (60Hz, with purge) • Inlet diameter: 160ISO-K • Exhaust diameter: 40ISO-KF
A1804XN • Model for corrosive gas exhaust (Ni coating) • Exhaust speed: 27,560 l/min (60Hz) • Achieved vacuum level: 1.45 Pa (60Hz, without purge), 2.4 Pa (60Hz, with purge) • Inlet diameter: 160ISO-K • Exhaust diameter: 40ISO-KF
A3004XN • Model for corrosive gas exhaust (Ni coating) • Exhaust speed: 48,140 l/min (60Hz) • Achieved vacuum level: 0.4 Pa (60Hz, without purge), 0.9 Pa (60Hz, with purge) • Inlet diameter: 160ISO-K • Exhaust diameter: 40ISO-KF
AD600H • Exhaust speed: 9,960 l/min (H2), 9,960 l/min (N2) • Achieved vacuum level: 2 Pa (with purge) • Inlet diameter: 100ISO-K • Exhaust diameter: 50ISO-KF
AD3060H • Exhaust speed: 54,780 l/min (H2), 53,120 l/min (N2) • Achieved vacuum level: 0.2 Pa (with purge) • Inlet diameter: 160ISO-K • Exhaust diameter: 50ISO-KF
AD4560H • Exhaust speed: 74,700 l/min (H2), 74,700 l/min (N2) • Achieved vacuum level: 0.2 Pa (with purge) • Inlet diameter: 200ISO-K • Exhaust diameter: 50ISO-KF

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伯東

伯東 本社

Electronic Components and Semiconductors

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Hakuto Co., Ltd. is a trading company specializing in electronics and providing technical services as a technology trading company and a manufacturer of chemical industrial products, creating a rich future where people and technology coexist by identifying individual needs. Our company was established in November 1953 as a trading company engaged in the import and sale of quartz crystals. The name "Hakuto" is derived from the first character of "Brazil," the origin of quartz, and "Tokyo," representing the east. This name embodies our strong desire to grow as an international trading company that connects not only Brazil and Tokyo but also the wider world. 【Manufacturers/Products Listed on Ipros】 Asahi Kasei / Sensors, Hall elements, ICs Crystal IS / UVC (Deep Ultraviolet) LEDs IMPINJ / RAIN RFID devices, systems, software

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