High-speed film formation is possible in the transition area! The luminescent state is monitored and recorded continuously in real-time.
The "EMICON series" is a plasma emission monitor that achieves high-speed film deposition in the transition region. In addition to measurement and control with high resolution, it enables accurate measurement and control by subtracting noise. It is equipped with a real-time continuous monitor that records plasma emission, and has a proven track record of PID control of processes through line integral measurement with over 1000 channels. 【Features】 ■ High-speed film deposition in the transition region ■ Measurement and control with high resolution ■ Accurate measurement and control by subtracting noise ■ Real-time monitor of plasma emission ■ Identification of emission *For more details, please refer to the PDF document or feel free to contact us.
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【Process Control】 ■ Reactive Sputtering Process - High-speed and uniform film formation in the transition area - Change to other process controls simply by switching recipes ■ Etching Process: Endpoint measurement and external output ■ Detection of Process Abnormalities: Leak detection and external output ■ Investigation and Resolution of Troubles: Compare with recorded normal data to quickly determine the cause *For more details, please refer to the PDF materials or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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At For You Co., Ltd., we offer spectrometers, plasma emission monitors, and emission analysis software. We handle PLASUS products and the emission wavelength identification and analysis software 'SpecLine,' so please feel free to consult us if you have any requests.