Extensive control over membrane properties! You can choose between water-cooled and heated substrate heating sources.
The "DLC Coating Device" has a wealth of accumulated data, achieving excellent film thickness distribution and reproducibility. The film formation sources can be selected from RF plasma CVD method and ionized deposition method. It can be used for semiconductors, electronic components, optical components, automotive parts, and more. Additionally, multi-chamber specifications and various custom-made options can be produced. Please feel free to contact us when you need assistance. 【Features】 ■ Film formation sources can be selected from RF plasma CVD method and ionized deposition method ■ Substrate heating sources can be selected from water-cooled and heated types ■ Achieves excellent film thickness distribution and reproducibility ■ Capable of film formation on various substrate materials ■ Extensive control over film properties *For more details, please refer to the PDF materials or feel free to contact us.
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basic information
【Other Features】 ■ Abundant accumulated data ■ Capable of tray transport ■ Multi-chamber specifications can also be produced ■ Various custom-made options are available ■ Sample processing conducted with demo equipment *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Applications】 ■Semiconductors ■Electronic components ■Optical components ■Automotive components ■Medical components *For more details, please refer to the PDF document or feel free to contact us.
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Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.
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