ジャパンクリエイト Company Profile

Business Activities

Our company is a manufacturer primarily focused on semiconductor manufacturing equipment, including wafer cleaning machines, etching devices, and spin dryers. We also manufacture both small research units and automated mass production devices tailored to our customers' needs, operating as a flexible company. Additionally, leveraging these technologies, we have developed and manufactured cleaning equipment for flat panel displays (FPD). Since all our products are manufactured in-house, we can offer them at competitive prices. *We have opened a new office in Nagareyama!! (As of January 1, 2021)* The Plasma Process Equipment Division at the Nagareyama office is a team of engineers specialized in vacuum and plasma technologies. Despite being a small elite group, we respond to our customers' diverse needs with high technical capabilities. Products handled: Plasma CVD equipment, sputtering devices, deposition equipment, dry etching devices, ashing devices, RTA equipment, and various composite devices. 〒270-0156 Chiba Prefecture, Nagareyama City, Nishihirai 956-1 Contact: TEL: 04-7150-5731 *We have acquired the film deposition equipment business for HDDs, Si wafers, glass substrates, and containers from Advanced Material Technologies Co., Ltd. (YOUTEC, Inc.).*

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CVD equipment

Achieving excellent film thickness distribution and reproducibility! Multi-chamber specifications and various custom-made options are also available.

We would like to introduce the "CVD equipment" that we handle. Starting with the "Oxide/Nitride Plasma CVD Equipment," which achieves low stress, high hardness, and high insulation through a two-frequency independent application method, we also offer a lineup that includes "DLC Coating Equipment" and "Carbon Nanotube Synthesis Equipment." We can also manufacture multi-chamber specifications and various custom orders. Please feel free to contact us when needed. 【Features of Oxide/Nitride Plasma CVD Equipment】 ■ Achieves excellent film thickness distribution and reproducibility ■ Reduces metal contamination through special surface treatment ■ Capable of controlling a wide range of film properties ■ Abundant accumulated data ■ Compatible with tray transport *For more details, please refer to the PDF materials or feel free to contact us.