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This product is a device that applies our specialized sputtering technology to form films on various three-dimensional shapes made of metal, ceramics, and resin. It can be used for applications such as cosmetics, electronic components, battery parts, and the development of high-functionality materials. In addition, we can propose various devices for miniaturization/large-scale production, CVD/various plasma treatments, barrel/drum types, and more. 【Features】 ■ Space-saving ■ Large capacity ■ Equipped with a unique sputter cathode ■ Stirring mechanism *For more details, please refer to the PDF materials or feel free to contact us.
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【Specifications (Excerpt)】 ■Workpiece: Please contact us as it varies by shape, size, material, etc. ■Sputter Cathode: Magnetron type ■Sputter Power Supply: RF or DC ■Process Gases: Ar, O2, N2, etc. ■Vacuum Exhaust: Diffusion pump + RP *For more details, please refer to the PDF document or feel free to contact us.
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[Usage] ■ Cosmetics, electronic components, battery components, development of high-performance materials *For more details, please refer to the PDF document and feel free to contact us.
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Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.