Space-saving and large capacity! Custom-made options are also available to meet various requests!
This product is a device that applies our specialized sputtering technology to form films on various three-dimensional shapes made of metal, ceramics, and resin. It can be used for applications such as cosmetics, electronic components, battery parts, and the development of high-performance materials. In addition, we can propose various devices for miniaturization/large-scale production, CVD/various plasma treatments, and barrel/drum types. 【Features】 ■ Space-saving ■ Large capacity ■ Equipped with a unique sputter cathode ■ Screw-type stirring mechanism *For more details, please refer to the PDF materials or feel free to contact us.
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【Specifications (Excerpt)】 ■Workpiece: Maximum 18L (varies by shape, size, material, etc.) ■Sputter Cathode: Magnetron type ■Sputter Power Supply: RF or DC ■Process Gases: Ar, O2, N2, others ■Vacuum Exhaust: Diffusion pump + RP *For more details, please refer to the PDF document or feel free to contact us.
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【Purpose】 ■ Cosmetics, electronic components, battery components, high-performance material development *For more details, please refer to the PDF document and feel free to contact us.
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Company information
Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.
![[Example of Use] Sputtering Target Composite Material SiC/Si](https://image.mono.ipros.com/public/product/image/f42/2000180520/IPROS14162266355367390576.jpeg?w=280&h=280)
