It is possible to remove the magnet while maintaining the spatter source in ultra-high vacuum.
This sputter source is a general-purpose compact magnetron sputter source compatible with ultra-high vacuum. Since the entire body is bakeable, it allows for film formation with minimal impurities even with highly reactive targets. 【Features】 - Ultra-high vacuum type that does not use O-rings - The magnet can be removed while maintaining the sputter source in ultra-high vacuum - Baking up to 300°C is possible by removing the magnet - The target is fixed with a retainer, allowing for quick replacement of the target - The gas inlet is integrated with the mounting flange, eliminating the need for a separate flange for gas introduction For more details, please contact us or download the catalog.
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basic information
【Specifications】 ○Mounting flange: ICF-152 ○Target size: 1.5 inch (circular) ○Target fixation: Retainer type ○Magnet material: SmCo ○Baking temperature: 300℃ ○DC power supply (optional) ●For more details, please contact us or download the catalog.
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Company information
The history of Kitano Seiki is also a trajectory of continuous contribution to cutting-edge research fields through the provision of precision instruments for research and development. In November 1958, we were established as a company specializing in the design, manufacturing, and sales of precision instruments. Since then, we have developed and manufactured experimental equipment aimed at research institutes in universities and government agencies, as well as basic research laboratories in private companies, earning high praise for our excellent quality and reliability. In particular, in recent years, we have been at the forefront of ultra-high vacuum and ultra-low temperature technologies, which are essential in industrial fields such as new materials, nanotechnology, flat panel displays, high-temperature superconductivity, solar cells, nuclear power, and space development. We have accumulated abundant technology and know-how in creating experimental environments and have linked this to the development and provision of equipment that condenses advanced performance and functionality. At Kitano Seiki, we always work closely with researchers, our users, to design and develop equipment that accurately supports research and development objectives. With a consistent system from parts manufacturing to various processing, assembly, inspection and testing, equipment setup, and after-sales support, we provide high-quality products and a conducive experimental environment for quality research and development.
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