Achieving excellent film thickness distribution and reproducibility! Multi-chamber specifications and various custom-made options are also available.
We would like to introduce the "CVD equipment" that we handle. Starting with the "Oxide/Nitride Plasma CVD Equipment," which achieves low stress, high hardness, and high insulation through a two-frequency independent application method, we also offer a lineup that includes "DLC Coating Equipment" and "Carbon Nanotube Synthesis Equipment." We can also manufacture multi-chamber specifications and various custom orders. Please feel free to contact us when needed. 【Features of Oxide/Nitride Plasma CVD Equipment】 ■ Achieves excellent film thickness distribution and reproducibility ■ Reduces metal contamination through special surface treatment ■ Capable of controlling a wide range of film properties ■ Abundant accumulated data ■ Compatible with tray transport *For more details, please refer to the PDF materials or feel free to contact us.
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basic information
【Product Lineup】 ■ Oxide Film / Nitride Film Plasma CVD Equipment ■ DLC Coating Equipment ■ Carbon Nanotube Synthesis Equipment ■ Plasma CVD Equipment for Three-Dimensional Objects ■ Plasma CVD Equipment for PET Bottles ■ Compact Plasma Equipment *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Custom Manufacturing Achievements (Excerpt)】 ■ HDD Media Ultra-Thin Film DLC Dual-Sided Coating Unit ■ HDD Head DLC Coating Equipment Multi-Chamber Specification ■ HDD Head DLC Coating Equipment Batch Specification ■ Film Width 380mm Compatible R to R Plasma CVD Equipment ■ R to R Superconducting Thin Film Thermal CVD Equipment ■ Width 650mm R to R Plasma CVD Electrode, etc. *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Japan Create has been challenging cutting-edge technologies to respond to the diversification of the semiconductor industry with high precision, labor-saving, and miniaturization. We seek infinite possibilities in high technology and create reliable know-how that matches user needs with our uniqueness. We will continue to strive towards high-level technology.
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