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USTRON (Astron) has been manufacturing and selling various high-purity deposition materials used in vacuum deposition at its own factory in China since 2002. We provide a wide range of vacuum deposition materials, including oxides, fluorides, sulfides, and pure metals, and we can also produce thin film materials in shapes and sizes according to the Haas liner. We cater to various customer needs. 【Features】 ■ Silicon Dioxide (SiO2) - Easy to manage deposition time due to standardized specifications - Low refractive index, suitable for electron resistance deposition and electron beam deposition ■ Tantalum Pentoxide (Ta2O5) - Low absorption coefficient, creating a smooth transmission rate curve - High refractive index with minimal gas generation during film formation - Suitable for electron gun deposition *For more details, please refer to the PDF document or feel free to contact us.
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【Lineup (Excerpt)】 ■ZnS: Zinc Sulfide ■CeO2: Cerium Oxide ■TiO: Titanium Monoxide ■Y2O3: Yttrium Oxide ■MG-X5: Alumina + Lanthanum ■MG-O2: Alumina + Lanthanum ■MgF2: Magnesium Fluoride ■SiO: Silicon Monoxide ■BaF2: Barium Fluoride, etc. *For more details, please refer to the PDF document or feel free to contact us.
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USTRON Co., Ltd. is a company that handles deposition materials, target materials, quartz products, and more. The products are produced in our own factory located in China. Compared to cases where products of equivalent prices are outsourced to other companies, we can provide higher quality products at lower costs. If any issues arise after delivery, you can rest assured. We will obtain detailed data from our factory regarding the production of the products. The ability to quickly analyze the cause of any problems is a unique advantage of having our own factory.