We will convert your hand-drawn images and CAD drawings into mask diagrams! We will create photomasks.
We offer "mask creation" services. We can accommodate substrate sizes up to 470×370. We convert customer-drawn images or CAD drawings into mask diagrams and produce photomasks. We have a lineup that includes "Cr masks," as well as "Em masks" and "Film masks." [Features] - Convert customer-drawn images or CAD drawings into mask diagrams - Accommodate substrate sizes up to 470×370 *Minimum size is approximately 4”×4” *For more details, please feel free to contact us.
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【Mask Types】 ■Cr Mask ・Substrate: Quartz Glass/Soda Glass ■Em Mask ・Substrate: Soda Glass ■Film Mask ・Substrate: Film *For more details, please feel free to contact us.
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Specifically, we receive requests for patterning processing on substrates for ACF, organic EL, material evaluation, MEMS, solar cells, and equipment evaluation using photolithography and etching technology from various companies, public research institutions, and research and development departments of universities. We specialize in fine pitch patterning of thin metal films, but we can also consider processing methods for thick films depending on the specifications, so please feel free to consult with us. Additionally, we also accept sputtering deposition processing only. We handle processing not only for glass substrates but also for various film substrates such as PC, PET, and PI. We also accept orders for substrate and film arrangement.