The system consists of the main unit, pump unit, and control panel! The chemical supply method is the CCSS method for organic solvent cleaning equipment.
We would like to introduce our "Organic Solvent Cleaning Equipment." This is an automatic etching cleaning device for 6" wafer cassettes, controlled by a PLC. It consists of the main unit, pump unit, and control panel. The cleaning process is batch cleaning, with a flow direction of left to right using three robotic transports. Please feel free to contact us if you have any inquiries. 【Main Specifications】 ■ Transport: 2 cassette transport for 6" wafers ■ Cleaning Process: Batch cleaning ■ Flow Direction: Left to right with three robotic transports ■ Control Method: PLC ■ Chemical Supply Method: CCSS method *For more details, please refer to the PDF document or feel free to contact us.
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basic information
【Process】 ■LD→SOLV.-1→SOLV.-2→N2 bubbling immersion→QDR (O/F) →2-STEPS CASCADE (DI)→F/R→S/D→UL/D *For more details, please refer to the PDF document or feel free to contact us.
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Applications/Examples of results
【Usage】 ■ For 6″ wafer cassette *For more details, please refer to the PDF document or feel free to contact us.
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Company information
Dan Science Co., Ltd. focuses on cleaning technology, purification technology, and measurement technology, particularly centered around clean technology. We look to the future from a wide range of perspectives and continue to create new products that leverage our development spirit since our founding. We carry out a consistent process from manufacturing to inspection of ultra-cleaning devices, air purification devices, and vacuum devices in a clean environment. Please feel free to contact us if you have any inquiries.
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