It has minimal impact on resin materials, excellent quick-drying effects, and the device itself is space-saving.
We would like to introduce the "Fluorine-based Cleaning System Particle Removal System" handled by Shin Ootsuka. This product utilizes fluorine-based solvents, taking advantage of low surface tension and permeability to thoroughly penetrate the product and remove particles. It has minimal impact on resin materials, excellent quick-drying effects, and the equipment itself is space-saving. It can also be used for drying applications after alcohol (IPA, ethanol). 【Features】 <Compact F Series (Type F-110)> ■ Suitable for prototype testing and laboratory use ■ Compatible with various fluorine-based solvents ■ Compact design (portable) ■ Capable of ultrasonic cleaning and steam cleaning ■ Liquid recycling (distillation regeneration) is possible *For more details, please refer to the related link page or feel free to contact us.
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【Applicable Fields (Partial)】 ■ C-MOS Sensors ■ Optical Lenses ■ Optical Fibers ■ LCD Components ■ Quartz Crystals ■ Magnetic Heads ■ HDD Components ■ Relay Components ■ Resin Parts Before Coating, etc. *For more details, please refer to the related links page or feel free to contact us.
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For more details, please refer to the related link page or feel free to contact us.
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Shin Otsuka Co., Ltd. aims to achieve higher cleaning performance and lower costs while minimizing the environmental impact on the Earth from the perspective of environmental protection as a comprehensive manufacturer of precision cleaning equipment. We will continue to deliver systems that meet your needs, including a fluorinated solvent-compatible cleaning system equipped with a unique cleaning agent recycling mechanism, ultrapure water cleaning systems, and hydrocarbon-based cleaning systems.