[Semiconductor Industry Case] Anti-Crawling Technology for Resist Liquid 'Nano Process'

We will introduce a coating example that can prevent the rise of resist liquid on the suction transport fixture.

We would like to introduce a case of surface treatment for device components that apply resist liquid to precision substrates. ■Consultation In the process of applying resist liquid to a thin film-like substrate, there was a consultation regarding the resist liquid adhering to the suction fixture during the application process to the precision substrate. ■Concern In the process of applying resist liquid to a thin film-like substrate, a problem arose where the resist liquid adhered to the suction fixture, causing it to stick to the next substrate being transported. The adhesion of resist liquid to the substrate leads to product defects, necessitating an increase in the cleaning frequency of the transport fixture, which hindered productivity. ■Request To solve the problem, we initially tried prototyping with Teflon™ coating, but the slight surface irregularities of the coating transferred as patterns onto the thin substrate, resulting in product defects. A surface treatment that balances precision and prevents the adhesion of resist liquid was necessary for problem resolution. 【Issues to be resolved】 - Adhesion of resist liquid - Cleaning time - Variability in coating thickness ■Adopted Coating 'NanoProcess® TC-10' *For detailed solutions, please download the PDF or contact us.

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