Plasma-assisted reactive film deposition is possible! It also supports options for integration.
The "FLARION series" is a plasma deposition and etching device. It enables plasma-assisted reactive deposition using the seamless ICP of the PLUM series. Additionally, it can be equipped with a substrate rotation mechanism, bias mechanism, and program-controlled axis motion mechanism, accommodating options for customization and integration. 【Features】 ■ Plasma-assisted reactive deposition possible with the seamless ICP of the PLUM series ■ Capable of being equipped with substrate rotation mechanism, bias mechanism, and program-controlled axis motion mechanism ■ Options available for customization and integration *For more details, please refer to the PDF materials or feel free to contact us.
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