As the exclusive domestic agent for Praxair's sputtering targets, we support our customers' manufacturing through a network spread across various regions in Japan.
Aiming for High Quality PRAXAIR has earned a reputation as a leading supplier through extensive research and development, as well as the manufacturing of the highest quality sputtering targets. AdvanTage Tantalum Targets AdvanTage tantalum targets provide consistent and reproducible process performance. They achieve reproducible sputtering film deposition through uniform thickness and mass production quality. Advanced manufacturing techniques generate a uniform microstructure, enhancing initial stability and ensuring consistent sputtering performance throughout the product's lifespan. Certified products are also available for each sputtering equipment manufacturer.
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Main Materials and Specifications Cu: 5N, 6N Ta: 3N5, 4N5 Pure Al: 5N, 5N5 W: 5N Carbon: 5N Al alloy (AlSi 1%, AlSi 1% Cu 0.5%, AlCu 0.5%): 5N5 Ti: 4N5, 5N Ni: 4N Ni/V: 3N5 Cr: 3N5 Co: 5N Ni/Pt: 3N5 Pt: 4N Ag: 5N Au: 5N
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In the 21st century, where IT transformation is accelerating and more advanced technologies are required in society and industry, expectations for gas are increasingly expanding. From bulk gases that are essential in production environments to ultra-high purity gases required for semiconductors and liquid crystals, we provide a diverse range of gas resources that are indispensable at every stage of the production process, ensuring stability and safety, and establishing a comprehensive sales and supply system that supports industrial development.
