Unbreakable! Non-abrasive! Low-cost 'Sputtering Target'

No need for pre-sputtering aimed at preventing oxidation films, allowing for a reduction in labor! This is a sputtering target that also minimizes cracking due to thermal expansion.

We supply Si targets that have reduced cracking through a special manufacturing process. Currently, Si targets are said to have a high incidence of cracking, but our unique manufacturing method can reduce this issue. We also manufacture and sell various other metal materials, oxides, and alloy targets according to customer requests. We can perform bonding processing with new target materials if you provide backing plates. Production is carried out at our affiliated factory in China, allowing us to offer low-cost solutions, while maintaining a production system based on quality standards in Japan. We can also conduct various analyses based on customer requests. 【Available Materials】 Metal Materials: Si, Nb, Ti, Cr, Ta, Al… Oxides: SiO2, Ta2O5, Al2O3, ITO… Alloy Materials: Cu+Ag, Ni+Cr, Ti+Cl… *We also provide introductory materials on the manufacturing process. *For more details, please refer to the PDF document or feel free to contact us.

Sputtering Equipment