[Market Report] Extreme Ultraviolet Lithography System Market
Report ID: AA02241108
The global extreme ultraviolet lithography (EUVL) system market is expected to reach 75 billion USD by 2031.
The global extreme ultraviolet lithography (EUVL) system market is experiencing remarkable growth, with revenues reaching $10 billion in 2022. Recent market analysis indicates that the market is rapidly expanding and is projected to reach $75 billion by 2031. This significant growth trajectory reflects a compound annual growth rate (CAGR) of 25.1% during the forecast period from 2023 to 2031. The extreme ultraviolet lithography (EUVL) system, which is the foundation of next-generation lithography (NGL) technology, is revolutionizing the semiconductor manufacturing process worldwide. Extreme ultraviolet lithography (EUVL) is at the forefront of semiconductor manufacturing, enabling the production of microchips and microprocessors with unparalleled precision and efficiency. EUVL systems, capable of printing lines as small as 30nm, represent a significant advancement over traditional optical lithography methods. For application details, please check the [PDF download] button or apply directly through the related links.
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Overview of Segmentation The global extreme ultraviolet lithography (EUVL) system market is classified based on light sources, equipment, and regions. By Light Source - Laser-produced plasma (LPP) - Vacuum spark - Gas discharge By Equipment - Mask - Light source - Mirror - Others Key Companies: - Canon Inc - Nikon Corporation - ASML - Ultratech Inc. - Vistec Semiconductor Systems - Intel Corporation - Nikon Corporation - NuFlare Technology Inc. - Samsung Corporation
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