Analysis of dual magnetron sputtering considering the correct shape is possible.
The particle-based plasma analysis software 'Particle-PLUS' developed by Wavefront Inc. can analyze simultaneous magnetron sputtering in devices where the substrate and target are not in equilibrium. With the cut cell creation feature, it allows for high-precision electric field calculations characteristic of orthogonal grids while considering accurate shapes and normal directions. *For more details, please download the PDF or feel free to contact us.*
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【Specifications】 ■Product Name: Particle-PLUS ■Price Range: Please inquire ■Delivery Time: Please inquire *For more details, please download the PDF or feel free to contact us.
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【Calculable Cases】 ■ Magnetron Sputtering ■ PVD, Plasma CVD ■ Capacitive Coupled Plasma (CCP) ■ Electrophoresis, etc. 【Features】 ■ Specializes in low-pressure plasma analysis ■ Combines axisymmetric models with mirror-symmetric boundary conditions to quickly obtain results without simulating the entire device ■ Excels in plasma simulation for low-pressure gases, which are difficult to compute with fluid models ■ Supports both 2D (two-dimensional) and 3D (three-dimensional) analyses, efficiently handling complex models ■ As a strength of our in-house developed software, customization to fit customer devices is also possible *For more details, please download the PDF or feel free to contact us.
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Download All Catalogs![[Case Study] Plasma Analysis of Particle-PLUS Simultaneous Sputtering Device](https://image.mono.ipros.com/public/catalog/image/01/922/774675/IPROS62395394559876083227.jpeg?w=120&h=170)
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