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  6. [Manufacturing Results] Plasma CVD Equipment for 3D Object Experimentation

[Manufacturing Results] Plasma CVD Equipment for 3D Object Experimentation

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last updated:Mar 11, 2025

DINOVAC
DINOVAC
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Introduced in the surface treatment process! The material of the vacuum chamber is made of stainless steel, with examples of products achieving a vacuum level of less than 1 Pa.

We would like to introduce our achievements in manufacturing a "Plasma CVD system for three-dimensional objects" for the automotive and motorcycle parts manufacturing industry. We have introduced a product equipped with a substrate heating mechanism that allows for the deposition of DLC, amorphous SiC, and other materials on three-dimensional objects (maximum set temperature: 500°C). Additionally, it features PC operation (sequencer control) for fully automated data logging. Please feel free to contact us when you need assistance. 【Overview of Achievements】 ■ Experimental plasma CVD system capable of film deposition on three-dimensional objects ■ Compatible film types: DLC, amorphous SiC, etc. ■ Equipped with a substrate heating mechanism (maximum set temperature: 500°C) ■ Fully automated and data logging via PC operation (sequencer control) *For more details, please refer to the related links or feel free to contact us.

    Vacuum Equipment
プラズマCVD装置.jpg

[Manufacturing Results] Plasma CVD Equipment for 3D Object Experimentation

プラズマCVD装置.jpg
プラズマCVD装置.jpg
  • Related Link - https://dinovac.co.jp/vacuum/#plasma-cvd

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【Product Specifications (Excerpt)】 ■ Vacuum Pump: Rotary Pump + Mechanical Booster Pump ■ Exhaust Pressure Control: Manual (Automatic available as an option) ■ Coating Target: Maximum φ100mm × 500mm ■ High-Frequency Output: Maximum 1kW ■ Matching Method: Automatic Matching Method ■ Lamp Heating: Maximum Set Temperature 500℃ *For more details, please refer to the related links or feel free to contact us.

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DINOVAC Inc. Company Profile

DINOVAC Inc. Company Profile

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DINOVAC

DINOVAC

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We design and manufacture equipment tailored to our customers' needs, ranging from film deposition devices such as CVD, sputtering, and evaporation systems to experimental and production equipment for both vacuum and atmospheric pressure, including atmospheric plasma and heating/drying furnaces. Additionally, we produce DLC films using the plasma CVD method, which is a type of CVD. We can also create silicon-based films such as a-SiC and SiOx. Please feel free to contact us if you have any inquiries.

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