With KAI Semiconductor's unique technology, plasma treatment is now possible on the inner walls of tubes!
With our unique plasma generation technology, we can produce approximately 10 meters of stable plasma within a tube with a diameter of 1mm.
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basic information
Our atmospheric pressure plasma technology causes almost no thermal damage, allowing for the treatment of samples that are sensitive to heat. Additionally, since it does not involve a concentrated arc state, it can process materials without causing charge damage, making it suitable for samples that include metals. It can also plasma-activate nitrogen, enabling low-cost and high-efficiency processing. For more details, please contact us or download the catalog.
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Applications/Examples of results
- Surface treatment during catheter manufacturing - Inner wall treatment of medical tubes - Cleaning inside the tube - Improvement of capillary phenomenon efficiency (heat pump) - Prevention of air pockets inside the tube (such as in syringes and medical tubes)
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Company information
KAI Semiconductor was established in September 2002 as a venture company originating from Kyoto Institute of Technology. It sells surface modification devices and deposition equipment using plasma technology. The powder plasma device released in 2010 was recognized for its high technical capabilities and received the "Kansai Front Runner Award" and the "Small and Medium Enterprises Technology Award." There are numerous implementation records at universities nationwide, AIST, major manufacturers, and R&D departments. We propose sales after you have had the opportunity to touch the actual product (demo unit). Additionally, we offer rental and leasing options to reduce the burden on our customers. We also accept various technical consultations beyond semiconductor-related matters. Furthermore, we process and sell quartz and Pyrex in small lots.
