Patterning of SiO2 film
Through photolithography and etching technology, fine patterning of SiO2 single-layer films and SiO2 + metal oxide films (film thickness 0.1 to 1 μm) is possible. ■Patterning of SiO2 insulating films ■Patterning of decorative laminated films For more details, please contact us.
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basic information
Through photolithography and etching technology, fine patterning of SiO2 single-layer films and SiO2 + metal oxide films (film thickness 0.1 to 1 μm) is possible. ■Patterning of SiO2 insulating films ■Patterning of decorative laminated films For more details, please contact us.
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Applications/Examples of results
■□■Usage Examples■□■ ■Touch Panel: Resistive Film Type / Capacitive Type ■Display: LCD / PDP / Organic EL / Electronic Paper ■Lighting & Energy: LED / Organic Solar Cells ■Bio, Optical, MEMS: Microchips / Diffraction Gratings / Sensors ■Mobile Decoration: Decoration (Glass, Film, Plastic) ■We can accommodate substrate materials such as glass, film, and plastic. Additionally, please consult us regarding combined technologies for plating and printing.
Company information
In 1983, we were established as a thin film metal patterning factory of Micron Technology Research Institute, focusing on LCD substrates and PDP substrates, and have been producing cutting-edge products using photolithography and etching technologies. In 2007, we became a separate company as Kiso Micro Co., Ltd., enhancing our commitment to challenge ourselves with more creative products and aiming to be a trusted company by our customers as a company that can create for the future. Please utilize our services from development to mass production.