Microwave Plasma Experimental Device MiPC-500
Introducing the plasma experimental equipment using microwaves handled by Arios Corporation. Arios Corporation, which designs all components such as plasma sources and microwave power supplies in-house, offers flexible designs that only we can provide. We will design and manufacture according to the specifications required by our customers. 【Features】 ○ Microwave experimental equipment capable of various plasma exposure experiments, including DLC films, carbon nanotubes, plasma sterilization, and vacuum ultraviolet irradiation, can be produced in a wide variety. ○ The substrate movement mechanism allows for arbitrary positioning of the substrate and plasma, enabling compatibility with various processes. ○ By inserting the substrate into the plasma, it is heated by the plasma, eliminating the need for a heater during diamond thin film production. ○ The exhaust system can accommodate rotary pumps and mechanical boosters, and can even support ultra-high vacuum conditions. ● For other functions and details, please download the catalog.
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basic information
Introducing the plasma experimental equipment using microwaves handled by Arios Corporation. With all components such as plasma sources and microwave power supplies designed in-house, Arios Corporation offers flexible designs that only we can provide. We will design and manufacture according to the specifications required by our customers. 【Features】 ○ Microwave experimental equipment capable of various plasma exposure experiments, including DLC films, carbon nanotubes, plasma sterilization, and vacuum ultraviolet irradiation, can be produced in a wide range. ○ The substrate movement mechanism allows for arbitrary positioning of the substrate and plasma, enabling compatibility with various processes. ○ By inserting the substrate into the plasma, it is heated by the plasma, eliminating the need for a heater during diamond thin film production. ○ The exhaust system can accommodate rotary pumps and mechanical boosters, and can also support ultra-high vacuum. ● For other functions and details, please download the catalog.
Price information
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Delivery Time
P3
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Company information
In 1972, the first president, Horita, established Taisei Sangyo Co., Ltd. using the entrance of his home as a workplace, and since then, we have been dedicated to technology development and research. Initially, we were involved in the development of devices such as the Polack counter for the Meteorological Research Institute, starting our work in the field of atmospheric science. Subsequently, we expanded our work into the vacuum world by starting maintenance services for leak detectors. Around the 10th anniversary of our founding, work in ultra-high vacuum began to increase, and by the 15th anniversary, we were able to manufacture small devices. Currently, our scope of work has significantly expanded, not only covering ultra-high vacuum, MBE, CVD, ECR, and RF radical sources, but also advancing the development of functional components utilizing various plasmas, ions, or electrons. In the future, we aim to become a small enterprise that can truly compete in the world of cutting-edge technology.
