RF Plasma Experimental Device RFPC-550
This is an introduction to the plasma experimental equipment using an RF 13.56MHz excitation plasma source handled by Arios Corporation. A flexible design that only Arios Corporation, which designs its own plasma sources, can provide. We will design and manufacture according to the specifications required by our customers. 【Features】 - Easy operation with automatic matching - Compact chamber and simple structure for easy maintenance - Equipped with interlocks for high voltage electric shock prevention against PF - Mechanisms that safely stop in case of high-frequency leakage or power outages - Option to add a load lock mechanism ● For other functions and details, please download the catalog.
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basic information
This is an introduction to the plasma experimental equipment using the RF 13.56MHz excitation plasma source handled by Arios Corporation. A flexible design that can only be achieved by Arios Corporation, which designs its own plasma sources. We will design and manufacture according to the specifications required by our customers. 【Features】 ○ Easy operation with automatic matching ○ Easy maintenance due to a compact chamber and simple configuration ○ Equipped with interlocks to prevent high voltage electric shock related to the power factor ○ Equipped with mechanisms to safely stop in case of high-frequency leakage or power outages ○ Optional load lock mechanism can be added ● For other functions and details, please download the catalog.
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Company information
In 1972, the first president, Horita, established Taisei Sangyo Co., Ltd. using the entrance of his home as a workplace, and since then, we have been dedicated to technology development and research. Initially, we were involved in the development of devices such as the Polack counter for the Meteorological Research Institute, starting our work in the field of atmospheric science. Subsequently, we expanded our work into the vacuum world by starting maintenance services for leak detectors. Around the 10th anniversary of our founding, work in ultra-high vacuum began to increase, and by the 15th anniversary, we were able to manufacture small devices. Currently, our scope of work has significantly expanded, not only covering ultra-high vacuum, MBE, CVD, ECR, and RF radical sources, but also advancing the development of functional components utilizing various plasmas, ions, or electrons. In the future, we aim to become a small enterprise that can truly compete in the world of cutting-edge technology.
