List of Heating equipment/furnace products

  • classification:Heating equipment/furnace

346~360 item / All 4506 items

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For those who have isolators. Achieving high chemical resistance and workability. Low cost and short delivery times are also possible for glove box and isolator gloves.

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  • TRON 5000 black n white.JPG
  • TRON 5000.JPG
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  • Butyl Smooth.JPG
  • Work gloves

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Notice of participation in 'INTERPHEX Week Tokyo' from May 20 (Wednesday) to May 22 (Friday), 2026.

Ito Corporation will be exhibiting at "INTERPHEX Week Tokyo" held at Makuhari Messe. This exhibition is the largest in Japan, showcasing a wide range of products and services related to the research and manufacturing of pharmaceuticals, cosmetics, and regenerative medicine from 25 countries and regions around the world. Pharmaceutical and cosmetic manufacturers, as well as regenerative medicine companies, will be attending from all over the globe. We will be showcasing "Gloves for Glove Boxes/Isolators" manufactured by Tron Power. We look forward to your visit.

A comfortable space year-round! Since it uses a heat pump air conditioning system, it has low CO2 emissions and contributes to reducing environmental impact.

  • air conditioning
  • Other heaters

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Minimize work inside the glove box ◎ Screening of solid electrolyte materials / Impedance evaluation by temperature characteristics ◎ Multiple uniform, short time, and accurate test evaluation

  • Lithium-ion battery
  • Secondary Cells/Batteries
  • Electric furnace

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"OCT-equipped heating observation imaging furnace" contributes to global research! Direct observation of internal structural changes at high temperatures.

The "OCT-equipped heating observation furnace" is a compact design that utilizes a focused heating method and is an internal observation device equipped with OCT (Optical Coherence Tomography). Using this device, a research group from Yokohama National University and the Kanagawa Institute of Industrial Science and Technology successfully observed the internal structural changes of ceramics during sintering at high temperatures for the first time in the world. For more details, please refer to the catalog. If you have any questions or inquiries, please feel free to contact us.

Rapid heating at approximately 50°C/sec using focused light heating method, with the possibility of rapid cooling when the heating lamp is turned off. Compatible with various atmospheres.

  • Electric furnace

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OCT搭載加熱観察イメージ炉.png

"OCT-equipped heating observation imaging furnace" contributes to global research! Direct observation of internal structural changes at high temperatures.

The "OCT-equipped heating observation furnace" is a compact design that utilizes a focused heating method and is an internal observation device equipped with OCT (Optical Coherence Tomography). Using this device, a research group from Yokohama National University and the Kanagawa Institute of Industrial Science and Technology successfully observed the internal structural changes of ceramics during sintering at high temperatures for the first time in the world. For more details, please refer to the catalog. If you have any questions or inquiries, please feel free to contact us.

UHV Ceramic Washer or Parts

  • Analytical Equipment and Devices
  • Ceramic Heater
  • Other terminal blocks

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Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.

  • Heating device
  • Electric furnace
  • Annealing furnace

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device
  • Annealing furnace
  • Electric furnace

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.

  • Heating device
  • Electric furnace
  • Other heaters

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1.jpg

4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

High-precision support for temperature control of analysis and evaluation devices. A film heater that provides a stable heat source.

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  • 画像‗ポリイミドヒーターイメージ.jpg
  • 広告案イメージ(シンワ測定).jpg
  • 面状発熱体_イメージ.jpg
  • Other heaters
  • Surface treatment contract service

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Achieves uniform heating, drying, and insulation. A sheet-type polyimide heater that supports the quality of food equipment.

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  • 画像‗イメージプリンター_シンワ測定_2019-11-22.png
  • 画像‗ポリイミドヒーターイメージ.jpg
  • 広告案イメージ(シンワ測定).jpg
  • 面状発熱体_イメージ.jpg
  • Other heaters
  • Surface treatment contract service

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Thin, lightweight, and reliably generates heat. This slim heater utilizes temperature control technology that supports the performance of electronic devices, effectively functioning even in limited sp...

  • シンワ測定?.png
  • 画像‗イメージプリンター_シンワ測定_2019-11-22.png
  • 画像‗ポリイミドヒーターイメージ.jpg
  • 広告案イメージ(シンワ測定).jpg
  • 面状発熱体_イメージ.jpg
  • Other heaters
  • Surface treatment contract service

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Uniform heating prevents freezing and condensation during winter. A film-type polyimide heater that also contributes to equipment protection.

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  • 画像‗イメージプリンター_シンワ測定_2019-11-22.png
  • 画像‗ポリイミドヒーターイメージ.jpg
  • 広告案イメージ(シンワ測定).jpg
  • 面状発熱体_イメージ.jpg
  • Other heaters
  • Surface treatment contract service

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Film heaters that lead to stable operation of insulation, drying, and processing processes for various devices.

  • シンワ測定?.png
  • 画像‗イメージプリンター_シンワ測定_2019-11-22.png
  • 画像‗ポリイミドヒーターイメージ.jpg
  • 広告案イメージ(シンワ測定).jpg
  • 面状発熱体_イメージ.jpg
  • Other heaters
  • Surface treatment contract service

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From temperature management to beauty devices. This is a thin heater that achieves safe and secure products with precise heat control.

  • シンワ測定?.png
  • 画像‗イメージプリンター_シンワ測定_2019-11-22.png
  • 画像‗ポリイミドヒーターイメージ.jpg
  • 広告案イメージ(シンワ測定).jpg
  • 面状発熱体_イメージ.jpg
  • Other heaters
  • Surface treatment contract service

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Stable operation even in clean room environments. This is a film heater equipped with high-precision temperature control technology that supports precise processes.

  • シンワ測定?.png
  • 画像‗イメージプリンター_シンワ測定_2019-11-22.png
  • 画像‗ポリイミドヒーターイメージ.jpg
  • 広告案イメージ(シンワ測定).jpg
  • 面状発熱体_イメージ.jpg
  • Other heaters
  • Surface treatment contract service

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