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3N高純度 シリコン(Si)粉末

Si純度>99.9% 3N高純度 シリコン粉末

材料:金属冶金法ポリシリコン(4N) 粒度:D50=8µmー10µm

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4N超高純度 シリコン(Si)粉末

Si純度>99.99% 4N超高純度 シリコン粉末 *25元素不純物合計<20.21ppm(GDMS分析 )

材料:シーメンス法バージンポリシリコン(6N以上) Si粉末不純物濃度:    25元素不純物濃度合計=20.21ppm(GDMS分析)    → Si+Others > 99.9979%    粉砕工程で2回の酸洗いと磁選により、高純度化を実現。 粉砕後酸素(O)濃度:0.29%(IGA分析)

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